Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography

Structural anti-reflective coating and bactericidal surfaces, as well as many other effects, rely on high-aspect-ratio (HAR) micro- and nanostructures, and thus, are of great interest for a wide range of applications. To date, there is no widespread fabrication of dense or isolated HAR nanopillars b...

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主要な著者:	Michael J. Haslinger, Oliver S. Maier, Markus Pribyl, Philipp Taus, Sonja Kopp, Heinz D. Wanzenboeck, Kurt Hingerl, Michael M. Muehlberger, Elena Guillén
フォーマット:	Artigo
言語:	Inglês
出版事項:	MDPI AG 2023-05-01
シリーズ:	Nanomaterials
主題:	nanoimprint lithography nanopattern transfer aspect ratio high aspect ratio nanopillars simulations for nanoimprinting
オンライン･アクセス:	https://www.mdpi.com/2079-4991/13/9/1556
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