Effect of wafer resistivity and light intensity on the topography of porous silicon surfaces produced by photo chemical method
This study includes the effect of wafer resistivity and intensity of light on topography of porous silicon surfaces which produced by photo chemical etching method, the results showed that changing of the resistivity led to change the porosity, where it found the porous silicon layer be less of h...
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| Principais autores: | , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Tikrit University
2023-01-01
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| coleção: | Tikrit Journal of Pure Science |
| Assuntos: | |
| Acesso em linha: | https://tjpsj.org/index.php/tjps/article/view/682 |
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