Wide-Gap p-μc-Si1-xOx:H Films and Their Application to Amorphous Silicon Solar Cells
Optimization of p-type hydrogenated microcrystalline silicon oxide thin films (p-μc-Si1-xOx:H) by very high frequency plasma enhanced chemical vapor deposition 40 MHz method for use as a p-layer of a-Si:H solar cells was performed. The properties of p-μc-Si1-xOx:H films were characterized by conduct...
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| Autors principals: | , , , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Wiley
2013-01-01
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| Col·lecció: | International Journal of Photoenergy |
| Accés en línia: | http://dx.doi.org/10.1155/2013/958326 |
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