Optical Characterization of Silicon Nitride-based Bilayer Thin Films Using Spectroscopic Ellipsometry and the Maxwell-Garnett Model
This study investigates the optical and geometrical properties of silicon oxynitride (SiOxNy) thin films, which were prepared using a low-pressure chemical vapor deposition (LPCVD) process at 850 °C from SiH2Cl2, N2O, and NH3 as precursors. The opto-geometrical parameters of these were determined th...
-д хадгалсан:
| Үндсэн зохиолчид: | , , , |
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| Формат: | Artigo |
| Хэл сонгох: | Inglês |
| Хэвлэсэн: |
Kaunas University of Technology
2025-10-01
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| Цуврал: | Elektronika ir Elektrotechnika |
| Нөхцлүүд: | |
| Онлайн хандалт: | https://eejournal.ktu.lt/index.php/elt/article/view/39263 |
| Шошгууд: |
Шошго байхгүй, Энэхүү баримтыг шошголох эхний хүн болох!
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