Rolled-Up Nanotech: Illumination-Controlled Hydrofluoric Acid Etching of AlAs Sacrificial Layers

<p>Abstract</p> <p>The effect of illumination on the hydrofluoric acid etching of AlAs sacrificial layers with systematically varied thicknesses in order to release and roll up InGaAs/GaAs bilayers was studied. For thicknesses of AlAs below 10 nm, there were two etching regimes for the area under il...

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Үндсэн зохиолчид:	Costescu Ruxandra, Deneke Christoph, Thurmer Dominic, Schmidt Oliver
Формат:	Artigo
Хэл сонгох:	Inglês
Хэвлэсэн:	SpringerOpen 2009-01-01
Цуврал:	Nanoscale Research Letters
Нөхцлүүд:	Rolled-up Nanotubes Nanotech Nanostructures Etching Hydrofluoric acid III–V layers Illumination-controlled
Онлайн хандалт:	http://dx.doi.org/10.1007/s11671-009-9421-8
Шошгууд:	Шошго нэмэх Шошго байхгүй, Энэхүү баримтыг шошголох эхний хүн болох!