Constraint-Aware Robustness and Multi-Objective Synthesis of Multi-Layer DUV Interference Coatings

The evolution of 193 nm deep-ultraviolet (DUV) lithography toward high numerical aperture (NA > 1.35) presents challenges approaching physical limits for antireflective (AR) coatings on strongly curved lens elements. In this study, a full-stack multi-objective optimization framework is developed by...

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Principais autores:	Haoran Song, Lipu Zhang
Formato:	Artigo
Idioma:	Inglês
Publicado em:	MDPI AG 2026-06-01
coleção:	Modelling
Assuntos:	deep-ultraviolet strongly curved substrates multi-objective optimization transfer matrix method Pareto optimal solution
Acesso em linha:	https://www.mdpi.com/2673-3951/7/3/117
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