Influence of Different Post Porosification Cleaning Steps on the Parameters of Porous Silicon Layer Stack

To grow a defect-free epitaxial silicon wafer (EpiWafer) on a reorganized porous silicon layer stack, the surface must be closed, smooth and particle-free. A post-porosification cleaning step prior to reorganization should significantly reduce the density of (metallic) particles on the surface. In...

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Autores principales:	Sarah Sanz, Yves Patrick Botchak Mouafi, Gabriel Micard, Giso Hahn, Barbara Terheiden
Formato:	Artigo
Lenguaje:	Inglês
Publicado:	TIB Open Publishing 2024-02-01
Colección:	SiliconPV Conference Proceedings
Materias:	Porous Silicon Crystalline Silicon Epitaxial Silicon Wafer Silicon Surface Cleaning
Acceso en línea:	https://www.tib-op.org/ojs/index.php/siliconpv/article/view/882
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