Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy
Alumina deposit was produced by metalorganic chemical vapour deposition process on a NiCoCrAlY superalloy substrate. Low frequency injection in the range 5–10 Hz was used to feed the Aluminium Tri-isopropoxide precursor into a deposit chamber holding at 400 °C of temperature. Both scanning electron...
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| Principais autores: | , , |
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| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
Elsevier
2022-09-01
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| Serija: | Materials Letters: X |
| Teme: | |
| Online dostop: | http://www.sciencedirect.com/science/article/pii/S2590150822000400 |
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