Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic deep reactive-ion etching techniques. The desi...

Ausführliche Beschreibung

Bibliografische Detailangaben

Hauptverfasser:	Angela Mihaela Baracu, Marius Andrei Avram, Carmen Breazu, Mihaela-Cristina Bunea, Marcela Socol, Anca Stanculescu, Elena Matei, Paul Conrad Vaagen Thrane, Christopher Andrew Dirdal, Adrian Dinescu, Oana Rasoga
Format:	Artigo
Sprache:	Inglês
Veröffentlicht:	MDPI AG 2021-09-01
Schriftenreihe:	Nanomaterials
Schlagworte:	EBL patterning cryogenic etching process stamp fabrication UV-NIL patterning
Online-Zugang:	https://www.mdpi.com/2079-4991/11/9/2329
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