Development of optimized nanogap plasmonic substrate for improved SERS enhancement
SERS enhancement factor (EF) of planar substrates depends on the size and shape of the fine nanostructure forming a defect free, well-arranged matrix. Nano-lithographic process is considered to be the most advanced methods employed for the fabrication SERS substrates. N...
Gardado en:
| Principais autores: | , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
AIP Publishing LLC
2017-05-01
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| Series: | AIP Advances |
| Acceso en liña: | http://dx.doi.org/10.1063/1.4984769 |
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