Influence of electron beam exposure dose on the properties of NbN superconducting nanowires
The controllable fabrication of superconducting nanowires is the key foundation for the high-performance applications such as single-photon detectors and quantum phase slip devices. Electron beam lithography, as a key technique for nanoscale patterning, may have a non-ignorable impact on the intrins...
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| Главные авторы: | , , , , , |
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| Формат: | Artigo |
| Язык: | Chinês |
| Опубликовано: |
Shanghai Institute of Microsystem and Information Technology
2025-12-01
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| Серии: | Gongneng cailiao yu qijian xuebao |
| Предметы: | |
| Online-ссылка: | https://www.jfmd.net.cn/article/doi/10.20027/j.gncq.2025.0052 |
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