Formation of Graphite-Copper/N-Silicon Schottky Photovoltaic Diodes Using Different Plasma Technologies

Plasma spraying and magnetron sputtering were used to form graphite–copper films on an n-type silicon surface. The main objective of this work was to compare the properties of the obtained graphite–copper Schottky photodiodes prepared using two different layer formation methods and to evaluate the i...

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Detalles Bibliográficos

Principais autores:	Žydrūnas Kavaliauskas, Vilius Dovydaitis, Romualdas Kėželis, Liutauras Marcinauskas, Vitas Valinčius, Arūnas Baltušnikas, Aleksandras Iljinas, Giedrius Gecevičius, Vytautas Čapas
Formato:	Artigo
Idioma:	Inglês
Publicado:	MDPI AG 2021-10-01
Series:	Energies
Assuntos:	plasma spraying magnetron sputtering copper graphite Schottky photodiodes photovoltaic
Acceso en liña:	https://www.mdpi.com/1996-1073/14/21/6896
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