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Surface smoothing effect of an amorphous thin film deposited by atomic layer deposition on a surface with nano-sized roughness

Previously, Lau (one of the authors) pointed out that the deposition of an amorphous thin film by atomic layer deposition (ALD) on a substrate with nano-sized roughness probably has a surface smoothing effect. In this letter, polycrystalline zinc oxide deposited by ALD onto a smooth substrate was us...

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Библиографические подробности
Главные авторы: W. S. Lau, J. Zhang, X. Wan, J. K. Luo, Y. Xu, H. Wong
Формат: Artigo
Язык:Inglês
Опубликовано: AIP Publishing LLC 2014-02-01
Серии:AIP Advances
Online-ссылка:http://dx.doi.org/10.1063/1.4866988
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