Monitoring the Etching Process of Hi-Bi Fiber Through a Fiber Loop Mirror
A method for monitoring the etching process of Hi-Bi fiber is proposed and demonstrated. The birefringence of the etching fiber is accurately calculated by tracking the shift of the interference spectrum in a high-birefringence fiber loop mirror interferometer. Then, the degree of etching can be inf...
Tallennettuna:
| Päätekijät: | , , , |
|---|---|
| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
IEEE
2017-01-01
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| Sarja: | IEEE Photonics Journal |
| Aiheet: | |
| Linkit: | https://ieeexplore.ieee.org/document/8064194/ |
| Tagit: |
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