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A Review on Performance Improvement of Solid Oxide Cells via Atomic Layer Deposition

Atomic Layer Deposition (ALD) has emerged as a promising technique for fabricating thin films that enhance the performance of solid oxide fuel cells and solid oxide electrolysis cells. ALD allows for precise control over film thickness and composition at the atomic level, resulting in uniform and de...

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Bibliografische gegevens
Hoofdauteurs: Min Seong Gwon, Kyoungjae Ju, Jihwan An
Formaat: Artigo
Taal:Inglês
Gepubliceerd in: Korean Society for Precision Engineering 2025-12-01
Reeks:한국정밀공학회지
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Online toegang:http://www.jkspe.or.kr/upload/pdf/JKSPE-025-00017.pdf
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