Design and Analysis of a New Excitation Structure for Magnetron Sputtering

Magnetron sputtering systems are widely used for depositing industrially important coatings. Research has been conducted to optimize and improve these structures to increase coating effectiveness and target utilization. The paper investigates the engineering problem of uneven target etching caused b...

Descripció completa

Dades bibliogràfiques

Autors principals:	Ze-da Su, Yue-Jun An, Hui An, Yan-Jun Lu, Wen-Yu Deng, Li-Jun Qi, Ming Li
Format:	Artigo
Idioma:	Inglês
Publicat:	IEEE 2024-01-01
Col·lecció:	IEEE Access
Matèries:	Axisymmetric solenoidal excitation structure cylindrical magnetron sputtering high uniformity magnetic field distribution uniform magnetic field design
Accés en línia:	https://ieeexplore.ieee.org/document/10526228/
Etiquetes:	Afegir etiqueta Sense etiquetes, Sigues el primer a etiquetar aquest registre!