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Microsphere Photolithography Patterned Nanohole Array on an Optical Fiber

Microsphere Photolithography (MPL) is a nanopatterning technique that utilizes a self-assembled monolayer of microspheres as an optical element to focus incident radiation inside a layer of photoresist. The microspheres produces a sub-diffraction limited photonic-jet on the opposite side of each mic...

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Gorde:
Xehetasun bibliografikoak
Egile Nagusiak: Ibrahem Jasim, Jiayu Liu, Chen Zhu, Muhammad Roman, Jie Huang, Edward Kinzel, Mahmoud Almasri
Formatua: Artigo
Hizkuntza:Inglês
Argitaratua: IEEE 2021-01-01
Saila:IEEE Access
Gaiak:
Sarrera elektronikoa:https://ieeexplore.ieee.org/document/9354622/
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