Combinatorial Optimization of Metal‐Insulator‐Insulator‐Metal (MIIM) Diodes With Thickness‐Gradient Films via Spatial Atomic Layer Deposition

Abstract Metal‐insulator‐insulator‐metal (MIIM) diodes with thickness‐gradient films for the insulator layers are fabricated for the first time. Spatially varying atmospheric‐pressure chemical vapor deposition is used to deposit ZnO and Al2O3 films with orthogonal gradient directions, producing 414...

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Detalhes bibliográficos

Principais autores:	Abdullah H. Alshehri, Hatameh Asgarimoghaddam, Louis‐Vincent Delumeau, Viet Huong Nguyen, AlRasheed Ali, Mutabe Aljaghtham, Ali Alamry, Dogu Ozyigit, Mustafa Yavuz, Kevin P. Musselman
Formato:	Artigo
Idioma:	Inglês
Publicado em:	Wiley-VCH 2024-11-01
coleção:	Advanced Electronic Materials
Assuntos:	chemical vapor deposition combinatorial studies high‐throughput optimization metal‐insulator‐insulator‐metal diodes spatial atomic layer deposition thickness gradient films
Acesso em linha:	https://doi.org/10.1002/aelm.202400093
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