Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography
The prolonged and aggressive nature of scaling to augment the performance of silicon integrated circuits (ICs) and the technical challenges and costs associated with this has led to the study of alternative materials that can use processing schemes analogous to semiconductor manufacturing. We examin...
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| Главные авторы: | , , |
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| Формат: | Artigo |
| Язык: | Inglês |
| Опубликовано: |
MDPI AG
2017-09-01
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| Серии: | Nanomaterials |
| Предметы: | |
| Online-ссылка: | https://www.mdpi.com/2079-4991/7/10/304 |
| Метки: |
Нет меток, Требуется 1-ая метка записи!
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