Studying the Effect of Different Etching Parameters on the Physical Properties of Porous Silicon Prepared By Electrochemical Etching
In this work we prepared a porous Silicon (PS) layer by electrochemical etching (ECE) technique using different etching parameters including current density, anodization time and Hydrofluoric (HF) acid concentration. From the structural properties, we found that the full width half maximum of the ob...
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| Autors principals: | , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Unviversity of Technology- Iraq
2015-10-01
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| Col·lecció: | Engineering and Technology Journal |
| Matèries: | |
| Accés en línia: | https://etj.uotechnology.edu.iq/article_116734_3af0a5c0e21e0245be2460f5fdd857f8.pdf |
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