Electrodeposition of Copper Metal from the 1-Ethyl-3-methylimidazolium Fluoride ([EMIM]F)-urea-H2O System Containing Cu2O
In this work, [EMIM]F-urea-H2O system is capable of dissolving Cu2O, and then the metallic copper was electrodeposited from this system at room temperature. The reduction of Cu (I) in this system involves a quasi-reversible and one-step single-electron transfer process. The electrodeposition of copp...
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| Principais autores: | , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
The Electrochemical Society of Japan
2020-07-01
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| coleção: | Electrochemistry |
| Assuntos: | |
| Acesso em linha: | https://www.jstage.jst.go.jp/article/electrochemistry/88/4/88_20-00031/_pdf/-char/en |
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