Nanoscratch Testing of 3Al₂O₃·2SiO₂ EBCs: Assessment of Induced Damage and Estimation of Adhesion Strength

In this study, the structural integrity of mullite (3Al₂O₃·2SiO₂) films, deposited on silicon carbide (SiC) substrates using chemical vapor deposition (CVD), was investigated via increasing load nanoscratch tests. The films were configured by mullite columns of stoic...

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Detalhes bibliográficos

Principais autores:	Carlos Alberto Botero, Laura Cabezas, Vinod Kumar Sarin, Luis Llanes, Emilio Jiménez-Piqué
Formato:	Artigo
Idioma:	Inglês
Publicado em:	MDPI AG 2023-03-01
coleção:	Ceramics
Assuntos:	nanoscratch thin films mullite energy of adhesion interfacial fracture toughness
Acesso em linha:	https://www.mdpi.com/2571-6131/6/1/40
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