Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al₂O₃ Film Growth

In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al₂O₃ thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achieves up to a 16.4% increas...

Täydet tiedot

Bibliografiset tiedot

Päätekijät:	João Chaves, William Chiappim, Júlia Karnopp, Benedito Neto, Douglas Leite, Argemiro da Silva Sobrinho, Rodrigo Pessoa
Aineistotyyppi:	Artigo
Kieli:	Inglês
Julkaistu:	MDPI AG 2023-12-01
Sarja:	Nanomaterials
Aiheet:	plasma-activated water atomic layer deposition alumina growth per cycle
Linkit:	https://www.mdpi.com/2079-4991/13/24/3110
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