Effects of direct current bias on nucleation density of superhard boron-rich boron carbide films made by microwave plasma chemical vapor deposition
We report bias enhanced nucleation and growth of boron-rich deposits through systematic study of the effect of a negative direct current substrate bias during microwave plasma chemical vapor deposition. The current flowing through a silicon substrate with an applied bias of −250 V was investigated f...
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| Auteurs principaux: | , , |
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| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
IOP Publishing
2021-01-01
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| Collection: | Materials Research Express |
| Sujets: | |
| Accès en ligne: | https://doi.org/10.1088/2053-1591/abf38c |
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