Stable Cu2O Photoelectrodes by Reactive Ion Beam Sputter Deposition
Cu2O has been deposited on quartz substrates by reactive ion beam sputter deposition. Experimental results show that by controlling argon/oxygen flow rates, both n-type and p-type Cu2O samples can be achieved. The bandgap of n-type and p-type Cu2O were found to be 2.3 and 2.5 eV, respectively. The v...
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| Główni autorzy: | , , |
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| Format: | Artigo |
| Język: | Inglês |
| Wydane: |
Wiley
2018-01-01
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| Seria: | Advances in Materials Science and Engineering |
| Dostęp online: | http://dx.doi.org/10.1155/2018/3792672 |
| Etykiety: |
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