Investigation of the Integration of Strained Ge Channel with Si-Based FinFETs

door Buqing Xu, Guilei Wang, Yong Du, Yuanhao Miao, Yuanyuan Wu, Zhenzhen Kong, Jiale Su, Ben Li, Jiahan Yu, Henry H. Radamson
Gepubliceerd in 2022-04-01

Strained Si_0.2Ge_0.8/Ge multilayer Stacks Epitaxially Grown on a Low-/high-Temperature Ge Buffer Layer and Selective Wet-Etching of Germanium

door Lu Xie, Huilong Zhu, Yongkui Zhang, Xuezheng Ai, Guilei Wang, Junjie Li, Anyan Du, Zhenzhen Kong, Xiaogen Yin, Chen Li, Liheng Zhao, Yangyang Li, Kunpeng Jia, Ben Li, Henry H. Radamson
Gepubliceerd in 2020-08-01