A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based α-SiCN:H/α-SiCO:H Diffusion Barrier Films

Por Chen, Sheng-Wen, Wang, Yu-Sheng, Hu, Shao-Yu, Lee, Wen-Hsi, Chi, Chieh-Cheng, Wang, Ying-Lang
Publicado no Materials (Basel) (2012)