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Por Shekelle, P G, Wachter, R M, Pronovost, P J, Schoelles, K, McDonald, K M, Dy, S M, Shojania, K, Reston, J, Berger, Z, Johnsen, B, Larkin, J W, Lucas, S, Martinez, K, Motala, A, Newberry, S J, Noble, M, Pfoh, E, Ranji, S R, Rennke, S, Schmidt, E, Shanman, R, Sullivan, N, Sun, F, Tipton, K, Treadwell, J R, Tsou, A, Vaiana, M E, Weaver, S J, Wilson, R, Winters, B D
Publicado no Evid Rep Technol Assess (Full Rep) (2013)
Obter o texto integralPublicado no Evid Rep Technol Assess (Full Rep) (2013)
Obter o texto integral
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