Kazemi, A., He, X., Alaie, S., Ghasemi, J., Dawson, N. M., Cavallo, F., . . . Krishna, S. (2021). Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography. Sci Rep.
Stile di citazione ChicagoKazemi, Alireza, Xiang He, Seyedhamidreza Alaie, Javad Ghasemi, Noel Mayur Dawson, Francesca Cavallo, Terefe G. Habteyes, Steven R. J. Brueck, e Sanjay Krishna. "Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored By Interferometric Lithography." Sci Rep 2021.
Citazione MLAKazemi, Alireza, et al. "Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored By Interferometric Lithography." Sci Rep 2021.
Attenzione: Queste citazioni potrebbero non essere precise al 100%.