Hong, H., & Kim, D. S. (2020). Robust Topographical Micro-Patterning of Nanofibrillar Collagen Gel by In Situ Photochemical Crosslinking-Assisted Collagen Embossing. Nanomaterials (Basel).
Style de citation ChicagoHong, Hyeonjun, et Dong Sung Kim. "Robust Topographical Micro-Patterning of Nanofibrillar Collagen Gel By In Situ Photochemical Crosslinking-Assisted Collagen Embossing." Nanomaterials (Basel) 2020.
Style de citation MLAHong, Hyeonjun, et Dong Sung Kim. "Robust Topographical Micro-Patterning of Nanofibrillar Collagen Gel By In Situ Photochemical Crosslinking-Assisted Collagen Embossing." Nanomaterials (Basel) 2020.
Attention : ces citations peuvent ne pas être correctes à 100%.