Vlnieska, V., Zakharova, M., Mikhaylov, A., & Kunka, D. (2020). Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography. Polymers (Basel).
Chicago-стиль цитированияVlnieska, Vitor, Margarita Zakharova, Andrey Mikhaylov, and Danays Kunka. "Lithographic Performance of Aryl Epoxy Thermoset Resins As Negative Tone Photoresist for Microlithography." Polymers (Basel) 2020.
MLA-цитированиеVlnieska, Vitor, Margarita Zakharova, Andrey Mikhaylov, and Danays Kunka. "Lithographic Performance of Aryl Epoxy Thermoset Resins As Negative Tone Photoresist for Microlithography." Polymers (Basel) 2020.
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