APA Citation

Lee, S., Park, C., & Choi, U. (2020). A New Measure to Characterize the Degree of Self-Similarity of a Shape and Its Applicability. Entropy (Basel).

Citação norma Chicago

Lee, Sang-Hee, Cheol-Min Park, and UJin Choi. "A New Measure to Characterize the Degree of Self-Similarity of a Shape and Its Applicability." Entropy (Basel) 2020.

MLA Citation

Lee, Sang-Hee, Cheol-Min Park, and UJin Choi. "A New Measure to Characterize the Degree of Self-Similarity of a Shape and Its Applicability." Entropy (Basel) 2020.

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