Citazione APA

Manouras, T., & Argitis, P. (2020). High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results. Nanomaterials (Basel).

Stile di citazione Chicago

Manouras, Theodore, e Panagiotis Argitis. "High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results." Nanomaterials (Basel) 2020.

Citazione MLA

Manouras, Theodore, e Panagiotis Argitis. "High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results." Nanomaterials (Basel) 2020.

Attenzione: Queste citazioni potrebbero non essere precise al 100%.