Dyfyniad APA

Kim, K., Jang, J. S., Yoon, S., Yun, J., & Chung, N. (2020). Structural, Optical and Electrical Properties of HfO(2) Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition. Materials (Basel).

Dyfyniad Arddull Chicago

Kim, Kyoung-Mun, Jin Sub Jang, Soon-Gil Yoon, Ju-Young Yun, and Nak-Kwan Chung. "Structural, Optical and Electrical Properties of HfO(2) Thin Films Deposited At Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition." Materials (Basel) 2020.

Dyfyniad MLA

Kim, Kyoung-Mun, et al. "Structural, Optical and Electrical Properties of HfO(2) Thin Films Deposited At Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition." Materials (Basel) 2020.

Rhybudd: Mae'n bosib nad yw'r dyfyniadau hyn bob amser yn 100% cywir.