Kuchakova, I., Ionita, M. D., Ionita, E., Lazea-Stoyanova, A., Brajnicov, S., Mitu, B., . . . Yu Nikiforov, A. (2020). Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets. Materials (Basel).
Stile di citazione ChicagoKuchakova, Iryna, et al. "Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films By Direct Current and Radio-frequency Plasma Jets." Materials (Basel) 2020.
Citazione MLAKuchakova, Iryna, et al. "Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films By Direct Current and Radio-frequency Plasma Jets." Materials (Basel) 2020.
Attenzione: Queste citazioni potrebbero non essere precise al 100%.