Cita APA

Akaishi, R., Kitazawa, K., Gotoh, K., Kato, S., Usami, N., & Kurokawa, Y. (2020). Effect of the Niobium-Doped Titanium Oxide Thickness and Thermal Oxide Layer for Silicon Quantum Dot Solar Cells as a Dopant-Blocking Layer. Nanoscale Res Lett.

Chicago Style Citation

Akaishi, Ryushiro, Kohei Kitazawa, Kazuhiro Gotoh, Shinya Kato, Noritaka Usami, i Yasuyoshi Kurokawa. "Effect of the Niobium-Doped Titanium Oxide Thickness and Thermal Oxide Layer for Silicon Quantum Dot Solar Cells As a Dopant-Blocking Layer." Nanoscale Res Lett 2020.

Cita MLA

Akaishi, Ryushiro, et al. "Effect of the Niobium-Doped Titanium Oxide Thickness and Thermal Oxide Layer for Silicon Quantum Dot Solar Cells As a Dopant-Blocking Layer." Nanoscale Res Lett 2020.