Nicolai, E. N., Michelson, N. J., Settell, M. L., Hara, S. A., Trevathan, J. K., Asp, A. J., . . . Ludwig, K. A. (2018). Design Choices for Next-Generation Neurotechnology Can Impact Motion Artifact in Electrophysiological and Fast-Scan Cyclic Voltammetry Measurements. Micromachines (Basel).
Chicago Style CitationNicolai, Evan N., et al. "Design Choices for Next-Generation Neurotechnology Can Impact Motion Artifact in Electrophysiological and Fast-Scan Cyclic Voltammetry Measurements." Micromachines (Basel) 2018.
Cita MLANicolai, Evan N., et al. "Design Choices for Next-Generation Neurotechnology Can Impact Motion Artifact in Electrophysiological and Fast-Scan Cyclic Voltammetry Measurements." Micromachines (Basel) 2018.
Atenció: Aquestes cites poden no estar 100% correctes.