Chandran, R., Nowlin, K., & LaJeunesse, D. R. (2018). Nanosphere Lithography of Chitin and Chitosan with Colloidal and Self-Masking Patterning. Polymers (Basel).
Citação norma ChicagoChandran, Rakkiyappan, Kyle Nowlin, and Dennis R. LaJeunesse. "Nanosphere Lithography of Chitin and Chitosan With Colloidal and Self-Masking Patterning." Polymers (Basel) 2018.
Citação norma MLAChandran, Rakkiyappan, Kyle Nowlin, and Dennis R. LaJeunesse. "Nanosphere Lithography of Chitin and Chitosan With Colloidal and Self-Masking Patterning." Polymers (Basel) 2018.
Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.