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Wang, Guilei, et al. "Integration of Highly Strained SiGe in Source and Drain With HK and MG for 22 nm Bulk PMOS Transistors." Nanoscale Res Lett 2017.

Wang, Guilei, et al. "Integration of Highly Strained SiGe in Source and Drain With HK and MG for 22 nm Bulk PMOS Transistors." Nanoscale Res Lett 2017.