Shih, H., Lee, W., Kao, W., Chuang, Y., Lin, R., Lin, H., . . . Chen, M. (2017). Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing. Sci Rep.
Chicago Style CitationShih, Huan-Yu, Wei-Hao Lee, Wei-Chung Kao, Yung-Chuan Chuang, Ray-Ming Lin, Hsin-Chih Lin, Makoto Shiojiri, i Miin-Jang Chen. "Low-temperature Atomic Layer Epitaxy of AlN Ultrathin Films By Layer-by-layer, In-situ Atomic Layer Annealing." Sci Rep 2017.
Cita MLAShih, Huan-Yu, et al. "Low-temperature Atomic Layer Epitaxy of AlN Ultrathin Films By Layer-by-layer, In-situ Atomic Layer Annealing." Sci Rep 2017.
Atenció: Aquestes cites poden no estar 100% correctes.