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Influence of Surface Passivation on AlN Barrier Stress and Scattering Mechanism in Ultra-thin AlN/GaN Heterostructure Field-Effect Transistors

Ultra-thin AlN/GaN heterostructure field-effect transistors (HFETs) with, and without, SiN passivation were fabricated by the same growth and device processes. Based on the measured DC characteristics, including the capacitance-voltage (C-V) and output current-voltage (I-V) curves, the variation of...

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Publicat a:Nanoscale Res Lett
Autors principals: Lv, Y. J., Song, X. B., Wang, Y. G., Fang, Y. L., Feng, Z. H.
Format: Artigo
Idioma:Inglês
Publicat: Springer US 2016
Matèries:
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4994815/
https://ncbi.nlm.nih.gov/pubmed/27553382
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1591-6
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