Gharachorlou, A., Detwiler, M. D., Gu, X., Mayr, L., Klötzer, B., Greeley, J., . . . Zemlyanov, D. Y. (2015). Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111). ACS Appl Mater Interfaces.
Chicago Style CitationGharachorlou, Amir, et al. "Trimethylaluminum and Oxygen Atomic Layer Deposition On Hydroxyl-Free Cu(111)." ACS Appl Mater Interfaces 2015.
Cita MLAGharachorlou, Amir, et al. "Trimethylaluminum and Oxygen Atomic Layer Deposition On Hydroxyl-Free Cu(111)." ACS Appl Mater Interfaces 2015.
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