Xue, C., Wong, D., & Kasko, A. M. (2013). Complex dynamic substrate control: Dual-tone hydrogel photoresists allow double-dissociation of topography and modulus.
Stile di citazione ChicagoXue, Changying, Darice Wong, e Andrea M. Kasko. Complex Dynamic Substrate Control: Dual-tone Hydrogel Photoresists Allow Double-dissociation of Topography and Modulus. 2013.
Citazione MLAXue, Changying, Darice Wong, e Andrea M. Kasko. Complex Dynamic Substrate Control: Dual-tone Hydrogel Photoresists Allow Double-dissociation of Topography and Modulus. 2013.
Attenzione: Queste citazioni potrebbero non essere precise al 100%.