Haeberle, J., Henkel, K., Gargouri, H., Naumann, F., Gruska, B., Arens, M., . . . Schmeißer, D. (2013). Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al(2)O(3)-films. Beilstein-Institut.
Citación estilo ChicagoHaeberle, Jörg, Karsten Henkel, Hassan Gargouri, Franziska Naumann, Bernd Gruska, Michael Arens, Massimo Tallarida, and Dieter Schmeißer. Ellipsometry and XPS Comparative Studies of Thermal and Plasma Enhanced Atomic Layer Deposited Al(2)O(3)-films. Beilstein-Institut, 2013.
Cita MLAHaeberle, Jörg, et al. Ellipsometry and XPS Comparative Studies of Thermal and Plasma Enhanced Atomic Layer Deposited Al(2)O(3)-films. Beilstein-Institut, 2013.
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