Cacao, E. E., Nasrullah, A., Sherlock, T., Kemper, S., Kourentzi, K., Ruchhoeft, P., . . . Willson, R. C. (2013). High-Resolution, High-Throughput, Positive-Tone Patterning of Poly(ethylene glycol) by Helium Beam Exposure through Stencil Masks. Public Library of Science.
Chicago Style CitationCacao, Eliedonna E., Azeem Nasrullah, Tim Sherlock, Steven Kemper, Katerina Kourentzi, Paul Ruchhoeft, Gila E. Stein, and Richard C. Willson. High-Resolution, High-Throughput, Positive-Tone Patterning of Poly(ethylene Glycol) By Helium Beam Exposure Through Stencil Masks. Public Library of Science, 2013.
MLA CitationCacao, Eliedonna E., et al. High-Resolution, High-Throughput, Positive-Tone Patterning of Poly(ethylene Glycol) By Helium Beam Exposure Through Stencil Masks. Public Library of Science, 2013.