Hwang, M., Kim, H., Kim, E., Lee, J., & Koo, S. (2011). Enhanced photo-sensitivity through an increased light-trapping on Si by surface nano-structuring using MWCNT etch mask. Springer.
Citação norma ChicagoHwang, Min-Young, Hyungsuk Kim, Eun-Soo Kim, Jihoon Lee, and Sang-Mo Koo. Enhanced Photo-sensitivity Through an Increased Light-trapping On Si By Surface Nano-structuring Using MWCNT Etch Mask. Springer, 2011.
Deismireacht MLAHwang, Min-Young, et al. Enhanced Photo-sensitivity Through an Increased Light-trapping On Si By Surface Nano-structuring Using MWCNT Etch Mask. Springer, 2011.
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