Deismireacht APA

Sahu, B. S., Gloux, F., Slaoui, A., Carrada, M., Muller, D., Groenen, J., . . . Lhostis, S. (2011). Effect of ion implantation energy for the synthesis of Ge nanocrystals in SiN films with HfO(2)/SiO(2 )stack tunnel dielectrics for memory application. Springer.

Citação norma Chicago

Sahu, Bhabani Shankar, Florence Gloux, Abdelilah Slaoui, Marzia Carrada, Dominique Muller, Jesse Groenen, Caroline Bonafos, and Sandrine Lhostis. Effect of Ion Implantation Energy for the Synthesis of Ge Nanocrystals in SiN Films With HfO(2)/SiO(2 )stack Tunnel Dielectrics for Memory Application. Springer, 2011.

Deismireacht MLA

Sahu, Bhabani Shankar, et al. Effect of Ion Implantation Energy for the Synthesis of Ge Nanocrystals in SiN Films With HfO(2)/SiO(2 )stack Tunnel Dielectrics for Memory Application. Springer, 2011.

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