Chemical Patterning of Ultrathin Polymer Films by Direct-Write Multiphoton Lithography

We applied 2-photon laser ablation to write sub-diffraction nanoscale chemical patterns into ultrathin polymer films under ambient conditions. Poly(ethylene glycol) methacrylate brush layers were prepared on quartz substrates via surface initiated atom transfer radical polymerization (SI-ATRP) and a...

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Hlavní autoři: Jeon, Hojeong, Schmidt, Ray, Barton, Jeremy E., Hwang, David J., Gamble, Lara J., Castner, David G., Grigoropoulos, Costas P., Healy, Kevin E.
Médium: Artigo
Jazyk:Inglês
Vydáno: 2011
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On-line přístup:https://ncbi.nlm.nih.gov/pmc/articles/PMC3086137/
https://ncbi.nlm.nih.gov/pubmed/21452872
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/ja200313q
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