Liao, L., Bai, J., Lin, Y., Qu, Y., Huang, Y., & Duan, X. (2010). High Performance Top-Gated Graphene Nanoribbon Transistors Using Zirconium Oxide Nanowires as High-k Gate Dielectrics.
استشهاد بنمط شيكاغوLiao, Lei, Jingwei Bai, Yungchen Lin, Yongquan Qu, Yu Huang, و Xiangfeng Duan. High Performance Top-Gated Graphene Nanoribbon Transistors Using Zirconium Oxide Nanowires As High-k Gate Dielectrics. 2010.
MLA استشهادLiao, Lei, et al. High Performance Top-Gated Graphene Nanoribbon Transistors Using Zirconium Oxide Nanowires As High-k Gate Dielectrics. 2010.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.