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Convergence Of Iterative Solvers For Non-Linear Step-And-Flash Imprint Lithography Simulations

The paper presents the analysis of the iterative solvers utilized to solve the non-linear problemof Step-and-Flash Imprint Lithography (SFIL) a modern patterning process. The simulationsconsists in solving molecular statics problem for the polymer network, with quadratic potentials.The model disting...

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Auteur principal: Maciej Paszyński
Format: Artigo
Langue:Inglês
Publié: AGH University of Science and Technology Press 2011-01-01
Collection:Computer Science
Sujets:
Accès en ligne:http://journals.agh.edu.pl/csci/article/download/101/47
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